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Supplier: Transene
Description: Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene
Description: Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.

Supplier: Transene
Description: Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene
Description: Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene
Description: NMP is suitable for a broad range of photoresist stripping applications.
Supplier: Transene
Description: Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.

Supplier: Transene
Description: Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene
Description: Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.

Supplier: Transene
Description: Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.

Supplier: Transene
Description: Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.

Supplier: Transene
Description: Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.

Supplier: Transene
Description: Transene Phosphoric Acid LM is a "low metals" phosphoric acid acid solution suitable for demanding semiconductor and electronics processing.

Supplier: Transene
Description: RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.

Supplier: Transene
Description: Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.

Supplier: Transene
Description: Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.

Supplier: Transene
Description: Wright Etchant is the classic defect delineation etchant for silicon semiconductor substrates.

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Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the call is still displayed and you need assistance, please call us at 1-800-932-5000.
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the call is still displayed and you need assistance, please call us at 1-800-932-5000.
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The original product is no longer available. The replacement shown is available.
This product is no longer available. Alternatives may be available by searching with the VWR Catalog Number listed above. If you need further assistance, please call VWR Customer Service at 1-800-932-5000.
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