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Description: Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Catalog Number: 76541-080
Supplier: Transene


Description: NMP is suitable for a broad range of photoresist stripping applications.
Catalog Number: 76540-974
Supplier: Transene

Description: Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
Catalog Number: 76541-050
Supplier: Transene


Description: Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Catalog Number: 76541-062
Supplier: Transene


Description: Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
Catalog Number: 76540-970
Supplier: Transene


Description: Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Catalog Number: 76540-933
Supplier: Transene


Description: Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Catalog Number: 76540-937
Supplier: Transene


Description: Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.
Catalog Number: 76541-016
Supplier: Transene


Description: Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.
Catalog Number: 76541-048
Supplier: Transene


Description: Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.
Catalog Number: 76540-960
Supplier: Transene


Description: Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Catalog Number: 76540-992
Supplier: Transene


Description: Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Catalog Number: 76540-994
Supplier: Transene


Description: Nichrome Etchant TFN is an effective etchant for Ni-Cr thin films in integrated circuits. Good photoresist compatibilty.
Catalog Number: 76541-008
Supplier: Transene


Description: Wright Etchant is the classic defect delineation etchant for silicon semiconductor substrates.
Catalog Number: 76541-007
Supplier: Transene


Description: Nickel Etchant TFB is an effective general purpose etchant for sputtered or evaporated pure nickel films.
Catalog Number: 76541-000
Supplier: Transene


Description: TRANSIST ND560 Negative Photoresist Kit is a collection of photolithography chemicals for high-resolution photopatterning for integrated circuit manufacture. The kit includes 1 pint of ND560 resist, 1 pint of thinner, 1 quart of rinse, 1 u
Catalog Number: 76540-920
Supplier: Transene


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